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Physics of the Solid State

Volumn 51, Issue 3, 2009, Pages 601-607

Influence of defects in a silicon dioxide thin layer on the processes of silicidation in the Fe/SiO2/Si(001) system

(4) Balashev, V V a,b Korobtsov, V V a,b Pisarenko, T A a,b Chusovitin, E A a

a INSTITUTE OF AUTOMATION AND CONTROL PROCESSES (Russian Federation)

b FAR EASTERN FEDERAL UNIVERSITY (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 62249175429 PISSN: 10637834 EISSN: None Source Type: Journal
DOI: 10.1134/S1063783409030287 Document Type: Article

Times cited : (3)

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