Surface and interface reactions of catalysts for carbon nanotube growth on Si substrates studied by soft X-ray photoelectron spectroscopy

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 24, Issue 1-2 SPEC. ISS., 2004, Pages 19-25

  Maeda, F ^a   Laffosse, E ^a,f   Watanabe, Y ^a   Suzuki, S ^a   Homma, Y ^a   Suzuki, M ^b   Kitada, T ^b   Ogiwara, T ^b   Tanaka, A ^c   Kimura, M ^d   Mihai, V A ^e   Yoshikawa, H ^e   Fukushima, S ^e  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

^b NTT Advanced Technology Corporation   (Japan)

^c ULVAC PHI Inc   (Japan)

^d Hyogo 678 1205   (Japan)

^e NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^f CEA LETI   (France)

Author keywords

Catalyst; Photoelectron spectroscopy; Surface reaction; Synchrotron radiation

Indexed keywords

CATALYSTS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; MORPHOLOGY; PHOTOELECTRON SPECTROSCOPY; SEMICONDUCTING SILICON; SUBSTRATES; SURFACE REACTIONS; SYNCHROTRON RADIATION;

CHEMICAL STATES; METAL CATALYSTS; SILICIDES;

CARBON NANOTUBES;

EID: 3142681636     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2004.04.017     Document Type: Conference Paper

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