Comparative investigation of the nucleation and growth of fcc-metal particles (Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au) on amorphous carbon and SiO2 substrates during vapor deposition at elevated temperatures

Surface Science

Volumn 349, Issue 3, 1996, Pages 301-316

  Schmidt, A A ^a   Eggers, H ^a   Herwig, K ^a   Anton, R ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

Author keywords

Adatoms; Adsorption kinetics; Carbon; Clusters; Diffusion and migration; Electron microscopy; Growth; Models of surface kinetics; Nucleation; Physical adsorption; Silicon oxides; Surface diffusion

Indexed keywords

AMORPHOUS MATERIALS; CARBON; COMPUTER SIMULATION; CRYSTAL GROWTH; METALS; NUCLEATION; PARTICLES (PARTICULATE MATTER); SILICA; SUBSTRATES; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION;

AMORPHOUS CARBON; ELEVATED TEMPERATURES; SURFACE DIFFUSION;

SURFACE PHENOMENA;

EID: 0030130348     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01023-8     Document Type: Article

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