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Volumn 536, Issue 1-3, 2003, Pages 130-138

Photoemission study of the iron-induced chemical reduction of silicon native oxide

Author keywords

Evaporation and sublimation; Iron; Metal oxide semiconductor (MOS) structures; Photoelectron spectroscopy; Silicon; Silicon oxides

Indexed keywords

EVAPORATION; KINETIC ENERGY; OXIDATION; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; REDUCTION; SILICON WAFERS; SUBLIMATION;

EID: 0038445504     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00581-8     Document Type: Article
Times cited : (13)

References (29)
  • 13
    • 0038524820 scopus 로고    scopus 로고
    • private communication
    • I.G. Brown, private communication.
    • Brown, I.G.1
  • 14
    • 0037848463 scopus 로고    scopus 로고
    • http://www.uni-leipzig.de/ unifit/.
  • 15
    • 0038186229 scopus 로고    scopus 로고
    • SRIM, the Stopping and Range of Ions and Matter software is downloadable at .


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.