Thin film nanostructures prepared via self-assembly of partly labile protected block copolymers for hybrid patterning strategies

Macromolecules

Volumn 42, Issue 1, 2009, Pages 156-163

  Messerschmidt, M ^a   Millaruelo, M ^b   Choinska, R ^c   Jehnichen, D ^a   Voit, B ^a  

^a LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

^b Formerly Baver Material Science AG   (Germany)

^c WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE MEASUREMENT; ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; CONTACT ANGLE; COPOLYMERIZATION; HEATING; NANOSTRUCTURES; PLASTIC PRODUCTS; POLYMERS; THIN FILM DEVICES; THIN FILMS;

AFM; BLOCK COMPOSITIONS; BLOCK COPOLYMER FILMS; BLOCK RATIOS; BULK SAMPLES; CONTACT-ANGLE MEASUREMENTS; DILUTE SOLUTIONS; FILM MORPHOLOGIES; FILM NANOSTRUCTURES; HOMOPOLYMER; HYDROXYSTYRENE; NANO-STRUCTURED; POLY (4 HYDROXYSTYRENE) (PHS); PREPARATION PARAMETERS; PREPARATION TECHNIQUES; PROTECTING GROUPS; SELF- ASSEMBLIES; TEMPERATURE DEPENDENTS; THIN-FILM MORPHOLOGIES;

FILM PREPARATION;

EID: 61649124790     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma8019915     Document Type: Article

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