Test particle simulation of the role of ballistic electrons in hybrid dc/rf capacitively coupled C F4 plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 2, 2009, Pages 287-294

  Ventzek, P L G ^a,b   Denpoh, K ^a  

^a TOKYO ELECTRON LTD   (Japan)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PLASMAS; BALLISTIC ELECTRONS; CAPACITIVELY COUPLED; DC BIAS; DC BIASED; DC POWER; DC SHEATHS; DC-BIAS VOLTAGES; DISCHARGE PROPERTIES; ELECTRON ATTACHMENTS; ELECTRON DENSITIES; ELECTRON ENERGIES; ELECTRONEGATIVE GAS; EQUIPMENT TECHNOLOGIES; EQUIVALENT RATIOS; GAS COMPOSITIONS; HIGH-ENERGY ELECTRONS; IONIZATION MECHANISMS; IONIZATION RATES; LARGE CROSS-SECTIONS; LOW FREQUENCIES; MACROSCOPIC PROPERTIES; MONTE CARLO SIMULATIONS; PLASMA ELECTRON DENSITIES; POTENTIAL WELLS; PRIMARY CONTRIBUTIONS; RF-POWER; SECONDARY ELECTRONS; SELF BIAS; SELF CONFINEMENTS; SEMICONDUCTOR MANUFACTURING; SUBSTRATE ELECTRODES; TEST PARTICLES; THERMAL ELECTRONS; THERMALIZATION; TRANSIT TIME; VIBRATIONAL EXCITATIONS;

ARGON; ATOMS; BALLISTICS; CARRIER CONCENTRATION; CONSTRUCTION EQUIPMENT; ELECTRIC DISCHARGES; ELECTRIC FIELDS; ELECTRIC POWER MEASUREMENT; ELECTRON DENSITY MEASUREMENT; ELECTRONS; IONIZATION OF GASES; KINETIC THEORY; MONTE CARLO METHODS; OPTICAL RESOLVING POWER; PLASMA ETCHING; PLASMA SOURCES; RATE CONSTANTS; SUBSTRATES; TESTING; THERMIONIC EMISSION;

DENSITY OF GASES;

EID: 61449254408     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3072922     Document Type: Article

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