SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Thin Solid Films

Volumn 322, Issue 1-2, 1998, Pages 254-258

Electron beam stabilization and dissolution behaviors of advanced deep UV photoresist for sub 0.3 μm microelectronics fabrication

(2) Shi, Frank F a Yu, Shuhuan b

a Integrated Device Technology (United States)

b ZHEJIANG UNIVERSITY (China)

Author keywords

DUV; E beam; Microelectronics; Photolithography; Photoresist

Indexed keywords

ANNEALING; DISSOLUTION; ELECTRON BEAMS; MICROELECTRONIC PROCESSING; ULTRAVIOLET RADIATION;

CRITICAL DIMENSION (CD) CONTROL; PHOTO ACID GENERATOR (PAG); POST EXPOSURE BAKE (PEB); POST EXPOSURE DELAY (PED) STABILITY;

PHOTORESISTS;

EID: 0032496521 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00956-5 Document Type: Article

Times cited : (6)

References (18)

1
- 0030686746
- R.D. Allen, G.M. Wallraff, D.C. Hofer, R.R. Kunz, IBM J. Res. Dev. 41 (1997) 95.
- (1997) IBM J. Res. Dev. , vol.41 , pp. 95
- Allen, R.D.¹ Wallraff, G.M.² Hofer, D.C.³ Kunz, R.R.⁴

2
- 0347687029
- L.F. Thompson, C.G. Willson, S. Tagawa (Eds.), Polymers for Microelectronics Resist and Dielectrics
- V. Rao, W.D. Hinsberg, C.W. Frank, R.F.W. Pease, in: L.F. Thompson, C.G. Willson, S. Tagawa (Eds.), Polymers for Microelectronics Resist and Dielectrics, ACS Symposium Series 537, 1994.
- (1994) ACS Symposium Series , vol.537
- Rao, V.¹ Hinsberg, W.D.² Frank, C.W.³ Pease, R.F.W.⁴

3
- 0030714728
- H. Ito, IBM J. Res. Dev. 41 (1997) 69.
- (1997) IBM J. Res. Dev. , vol.41 , pp. 69
- Ito, H.¹

4
- 0025791333
- S.A. MacDonald, N.J. Clecak, H.R. Wendt, C.G. Willson, C.D. Snyder, C.J. Knors, N.B. Deyoe, J.G. Maltabes, J.R. Morrow, A.E. McGuire, S.J. Holmes, Proc. SPIE 1466 (1991) 2.
- (1991) Proc. SPIE , vol.1466 , pp. 2
- MacDonald, S.A.¹ Clecak, N.J.² Wendt, H.R.³ Willson, C.G.⁴ Snyder, C.D.⁵ Knors, C.J.⁶ Deyoe, N.B.⁷ Maltabes, J.G.⁸ Morrow, J.R.⁹ McGuire, A.E.¹⁰ Holmes, S.J.¹¹

5
- 0000411526
- O. Nalamasu, M. Cheng, A.G. Timko, V. Pol, E. Reichmanis, L.F. Thompson, J. Photopolym. Sci. Technol. 4 (1991) 299.
- (1991) J. Photopolym. Sci. Technol. , vol.4 , pp. 299
- Nalamasu, O.¹ Cheng, M.² Timko, A.G.³ Pol, V.⁴ Reichmanis, E.⁵ Thompson, L.F.⁶

6
- 17144366407
- T. Kumada, Y. Tanaka, A. Ueyama, S. Kubota, H. Koezuka, T. Hanawa, H. Morimoto, Proc. SPIE 1925 (1993) 31.
- (1993) Proc. SPIE , vol.1925 , pp. 31
- Kumada, T.¹ Tanaka, Y.² Ueyama, A.³ Kubota, S.⁴ Koezuka, H.⁵ Hanawa, T.⁶ Morimoto, H.⁷

7
- 85075978005
- A. Oikawa, N. Santoh, S. Miyata, Y. Hatakenaka, H. Tanaka, K. Nakagawa, Proc. SPIE 1925 (1993) 92.
- (1993) Proc. SPIE , vol.1925 , pp. 92
- Oikawa, A.¹ Santoh, N.² Miyata, S.³ Hatakenaka, Y.⁴ Tanaka, H.⁵ Nakagawa, K.⁶

8
- 0026449112
- H. Roschert, K.J. Przybilla, W. Spiess, H. Wengenroth, G. Pawlowski, Proc. SPIE 1672 (1992) 33.
- (1992) Proc. SPIE , vol.1672 , pp. 33
- Roschert, H.¹ Przybilla, K.J.² Spiess, W.³ Wengenroth, H.⁴ Pawlowski, G.⁵

9
- 0026477335
- D.J.H. Funhoff, H. Binder, R. Schwalm, Proc. SPIE 1672 (1992) 46.
- (1992) Proc. SPIE , vol.1672 , pp. 46
- Funhoff, D.J.H.¹ Binder, H.² Schwalm, R.³

10
- 84956265850
- H. Ito, W.P. England, R. Sooriyakumaran, N.J. Clecak, G. Breyta, W.D. Hinsberg, H. Lee, D.Y. Yoon, J. Photopolym. Sci. Technol. 6 (1993) 547.
- (1993) J. Photopolym. Sci. Technol. , vol.6 , pp. 547
- Ito, H.¹ England, W.P.² Sooriyakumaran, R.³ Clecak, N.J.⁴ Breyta, G.⁵ Hinsberg, W.D.⁶ Lee, H.⁷ Yoon, D.Y.⁸

11
- 0000538737
- H. Ito, G. Breyta, D. Hofer, R. Sooriyakumaran, K. Petrillo, D. Seeger, J. Photopolym. Sei. Technol. 7 (1994) 433.
- (1994) J. Photopolym. Sei. Technol. , vol.7 , pp. 433
- Ito, H.¹ Breyta, G.² Hofer, D.³ Sooriyakumaran, R.⁴ Petrillo, K.⁵ Seeger, D.⁶

12
- 0344002285
- G. Breyta, D.C. Hofer, H. Ito, D. Seeger, K. Petrillo, H. Moritz, T. Fischer, J. Photopolym. Sci. Technol. 7 (1994) 449.
- (1994) J. Photopolym. Sci. Technol. , vol.7 , pp. 449
- Breyta, G.¹ Hofer, D.C.² Ito, H.³ Seeger, D.⁴ Petrillo, K.⁵ Moritz, H.⁶ Fischer, T.⁷

13
- 0347056481
- H. Ito, Solid State Technol. 164 (1996).
- (1996) Solid State Technol. , vol.164
- Ito, H.¹

14
- 84989071121
- O. Nalamasu, E. Reichmanis, J.E. Hanson, R.S. Kanga, L.A. Heimbrook, A.B. Emerson, F.A. Baiocchi, S. Vaidys, Polym. Eng. Sci. 32 (1992) 1565.
- (1992) Polym. Eng. Sci. , vol.32 , pp. 1565
- Nalamasu, O.¹ Reichmanis, E.² Hanson, J.E.³ Kanga, R.S.⁴ Heimbrook, L.A.⁵ Emerson, A.B.⁶ Baiocchi, F.A.⁷ Vaidys, S.⁸

15
- 0347687032
- M. Ross, S. Slater, N. Munzel, H. Holzwarth, A. Timko, W. Krisa, J. Schell, Proc. OCG Interface Conf. On Microlithography, 181 (1995).
- (1995) Proc. OCG Interface Conf. on Microlithography , vol.181
- Ross, M.¹ Slater, S.² Munzel, N.³ Holzwarth, H.⁴ Timko, A.⁵ Krisa, W.⁶ Schell, J.⁷

16
- 60849136202
- K. Honda, B.T. Beauchemin Jr., R.J. Hurditch, A.J. Blakeney, Y. Kawabe, T. Kokubo, Proc. SPIE 1262 (1990) 493.
- (1990) Proc. SPIE , vol.1262 , pp. 493
- Honda, K.¹ Beauchemin B.T., Jr.² Hurditch, R.J.³ Blakeney, A.J.⁴ Kawabe, Y.⁵ Kokubo, T.⁶

17
- 24544441880
- D. Seeger, Solid State Technol. 115 (1997) 000.
- (1997) Solid State Technol. , vol.115 , pp. 000
- Seeger, D.¹

18
- 0347056480
- Santa Clara, CA, March
- S. Nour, E.K. Pavelchek, T. Lindsay, M.L. Moynihan, L. Gambin, SPIE's 22nd International Symposium on Microlithography, Santa Clara, CA, March, 1997.
- (1997) SPIE's 22nd International Symposium on Microlithography
- Nour, S.¹ Pavelchek, E.K.² Lindsay, T.³ Moynihan, M.L.⁴ Gambin, L.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.