Investigation of electron beam stabilization of 193nm photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 737-750

  Kim, Myoung Soo ^a   Park, Jong Woon ^a   Kim, Hak Joo ^a   Jun, Bum Jin ^a   Gil, Myoung Goon ^a   Kim, Bong Ho ^a   Ross, Matthew ^b   Livesay, William ^b  

^a Hynix Semiconductor Inc   (South Korea)

^b Electron Vision Corp San Diego   (United States)

Author keywords

Acrylate Type Resist; ArF (193nm) Photoresist; COMA Type Resist; Electron Beam Stabilization

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SHRINKAGE; SURFACE ROUGHNESS;

ELECTRON BEAM STABILIZATION;

PHOTORESISTS;

EID: 0034762610     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436905     Document Type: Article

References (6)