Influence of thermal annealing on microstructures of zinc oxide films deposited by RF magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 6 A, 2007, Pages 3319-3323

  Hiramatsu, Takahiro ^a,c   Furuta, Mamoru ^b,c   Furuta, Hiroshi ^b,c   Matsuda, Tokiyoshi ^b,c   Hirao, Takashi ^b,c  

^a CASIO   (Japan)

^b KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

^c Kochi Industrial Promotion Center   (Japan)

Author keywords

OES; Rf sputtering; Thermal desorption spectrometry; XRD; ZnO

Indexed keywords

ANNEALING; MICROSTRUCTURE; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

RF SPUTTERING; THERMAL DESORPTION SPECTROMETRY;

METALLIC FILMS;

EID: 34547828874     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.3319     Document Type: Article

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