Growth and electrical properties of ZnO thin films deposited by novel ion plating method

Thin Solid Films

Volumn 445, Issue 2, 2003, Pages 274-277

  Iwata, K ^a   Sakemi, T ^b   Yamada, A ^a   Fons, P ^a   Awai, K ^c   Yamamoto, T ^d   Matsubara, M ^a   Tampo, H ^a   Niki, S ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

^c Sumijyu Tech Center Company Limited   (Japan)

^d KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

II VI; Ion plating; Transparent conductive oxide; Zinc oxide; ZnO

Indexed keywords

CARRIER CONCENTRATION; FILM GROWTH; FLAT PANEL DISPLAYS; MAGNETIC FIELD EFFECTS; PLASMA DENSITY; SOLAR CELLS; ZINC OXIDE;

ION PLATING; TRANSPARENT CONDUCTIVE OXIDES (TCO);

THIN FILMS;

EID: 1642401962     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01160-X     Document Type: Conference Paper

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