Optimization of aluminum-doped ZnO thin-film deposition by magnetron sputtering for liquid crystal display applications

Physica Status Solidi (A) Applications and Materials Science

Volumn 204, Issue 9, 2007, Pages 3145-3151

  Minami, Tadatsugu ^a   Miyata, Toshihiro ^a   Ohtani, Yuusuke ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION CHAMBERS; INDIUM-TIN-OXIDE (ITO) TRANSPARENT ELECTRODES; MAGNETRON SPUTTERING DEPOSITION;

ALUMINUM; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; LIQUID CRYSTAL DISPLAYS; MAGNETRON SPUTTERING; ZINC OXIDE;

THIN FILMS;

EID: 34548770669     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200622533     Document Type: Conference Paper

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