AlN thin films grown by ion-beam-enhanced deposition and its application to SOI materials

Physica B: Condensed Matter

Volumn 324, Issue 1-4, 2002, Pages 229-234

  Men, Chuanling ^a,b   Xu, Zheng ^b   An, Zhenghua ^a   Xie, Xinyun ^a   Zhang, Miao ^a   Lin, Chenglu ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b TONGJI UNIVERSITY   (China)

Author keywords

AlN films; Ion beam enhanced deposition; SOI; The Smart Cut process

Indexed keywords

ALUMINUM NITRIDE; ION BEAM ASSISTED DEPOSITION; THERMAL CONDUCTIVITY; THIN FILMS;

ION BEAM ENHANCED DEPOSITION (IBED);

SILICON ON INSULATOR TECHNOLOGY;

EID: 0036848691     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(02)01318-2     Document Type: Article

References (11)

1. Watanabe Y. Surf. Eng. 14:1998;427.
2. Wang X., Kolitsch A., Prokert F., Moller W. Surf. Coat. Tech. 103/104:1998;334.
3. Edgar J.H., Carosella C.A., Eddy C.R., Smith D.T. J. Mater. Sci. Mater. Electron. 7:1996;247.
4. He X.J., Yang S.Z., Tao K., Fan Y.D. Mater. Chem. Phys. 51:1997;199.
5. Bengtsson S., Bergh M., Choumas M., Olesen C., Jeppson K.O. Jpn. J. Appl. Phys. 35:1996;4175.
6. Men C.L., Xu Z., Zheng Z.H., Duo X.Z., Zhang M., Lin C.L. Chin. Phys. Lett. 18:2001;1282.
7. Bruel M. Nucl. Instrum. Methods B. 108:1996;313.
8. Verardi P., Dinescu M., Stanciu C., Gerardi C., Mirenghi L., Sandu V. Mater. Sci. Eng. B. 50:1997;223.
9. Huang J., Wang L.W., Shen Q.W., Lin C.L., Ostling M. J. Electron. Mater. 28:1999;225.
10. Hubbard K.J., Schlom D.G. J. Mater. Res. 11:1996;2757.
11. Adam T., Kolodzey J., Swann C.P., Tsao M.W., Rabolt J.F. Appl. Sur. Sci. 175-176:2001;428.