Fabrication of aluminum nitride thin film and its oxidation behavior

Zairyo/Journal of the Society of Materials Science, Japan

Volumn 55, Issue 8, 2006, Pages 785-789

  Yamashita, Masashi ^a,b   Sasaki, Yukichi ^a   Ito, Hiroki ^a   Ohsato, Hitoshi ^b   Shibata, Noriyoshi ^a  

^a JAPAN FINE CERAMICS CENTER   (Japan)

^b NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Al2o3; AlN; DC magnetron sputtering; Oxidation

Indexed keywords

ALUMINUM NITRIDE; MAGNETRON SPUTTERING; OXIDATION; POLYCRYSTALLINE MATERIALS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

ANNEALING TEST; TARGET MATERIAL;

THIN FILMS;

EID: 33751066671     PISSN: 05145163     EISSN: None     Source Type: Journal    
DOI: 10.2472/jsms.55.785     Document Type: Article

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