The effects of carbon coating on nanoripples induced by focused ion beam

Applied Physics Letters

Volumn 94, Issue 7, 2009, Pages

  Ran, Guang ^a,b   Zhang, Jiaming ^b   Wei, Qiangmin ^b   Xi, Shengqi ^a   Zu, Xiaotao ^c   Wang, Lumin ^b  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b UNIVERSITY OF MICHIGAN   (United States)

^c UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; FOCUSED ION BEAMS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON COATINGS; EX-SITU ATOMIC FORCE MICROSCOPIES; NANO-SCALE DEVICES; NANORIPPLES; SCANNING ELECTRON MICROSCOPES; SELF-ASSEMBLED; SMOOTHING PROCESS;

SURFACE MORPHOLOGY;

EID: 60749135063     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3054641     Document Type: Article

References (26)

1. J. Lian, W. Zhou, Q. M. Wei, L. M. Wang, and L. A. Boatner, Appl. Phys. Lett. 88, 093112 (2006).
2. J. Zhang, Q. Wei, J. Lian, W. Jiang, W. J. Weber, and R. C. Ewing, Appl. Phys. Lett. 92, 193107 (2008).
3. T. M. Mayer, E. Chason, and A. J. Howard, J. Appl. Phys. 76, 1633 (1994).
4. E. Chason, T. M. Mayer, B. K. Kellerman, D. T. McIlroy, and A. J. Howard, Phys. Rev. Lett. 72, 3040 (1994).
5. J. Erlebacher, M. J. Aziz, E. Chason, M. B. Sinclari, and J. A. Floro, Phys. Rev. Lett. 82, 2330 (1999).
6. A. Datta, Y.-R. Wu, and Y. L. Wang, Phys. Rev. B 63, 125407 (2001).
7. S. Rusponi, C. Boragno, and U. Valbusa, Phys. Rev. Lett. 78, 2795 (1997).
8. S. Rusponi, G. Costantini, C. Boragno, and U. Valbusa, Phys. Rev. Lett. 81, 2735 (1998).
9. E. Chason, S. T. Picraux, J. M. Poate, J. O. Borland, M. I. Current, T. Diaz de la Rubia, D. J. Eaglesham, O. W. Holland, M. E. Law, C. W. Magee, J. W. Mayer, J. Melngailis, and A. F. Tasch, J. Appl. Phys. 81, 6513 (1997).
10. A. Cuenat and M. J. Aziz, Mater. Res. Soc. Symp. Proc. 696, 28 (2002).
11. S. Ichim and M. J. Aziz, J. Vac. Sci. Technol. B 23, 1068 (2005).
12. W. J. MoberlyChan, D. P. Adams, M. J. Aziz, G. Hobler, and T. Schenkel, MRS Bull. 32, 424 (2007).
13. W. J. MoberlyChan, T. E. Felter, and M. A. Wall, Microscopy Today, 14, 28 (2006).
14. W. J. MoberlyChan, Mater. Res. Soc. Symp. Proc. 960, 10 (2006).
15. A. Datta, Y. R. Wu, and Y. L. Wang, Phys. Rev. B 63, 125407 (2001).
16. Y. S. Katharria, S. Kumar, P. S. Lakshmy, D. Kanjilal, and A. T. Sharma, J. Appl. Phys. 102, 044301 (2007).
17. S. Habenicht, K. P. Lieb, J. Koch, and A. D. Wieck, Phys. Rev. B 65, 115327 (2002).
18. W. J. MoberlyChan and R. Sschalek, Mater. Res. Soc. Symp. Proc. 1059, KK01-07 (2008).
19. H. X. Qian, W. Zhou, Y. Q. Fu, and B. K. A. Ngoi, Appl. Surf. Sci. 240, 140 (2005).
20. B. Ziberi, F. Frost, Th. Hche, and B. Rauschenbach, Phys. Rev. B 75, 235310 (2005).
21. G. Ran, K.-D. Li, and L. Wang (unpublished).
22. R. M. Bradley and J. M. E. Harper, J. Vac. Sci. Technol. A 6, 2390 (1988).
23. R. Cuerno and A.-L. Barabasi, Phys. Rev. Lett. 74, 4746 (1995).
24. G. Carter, J. Appl. Phys. 85, 455 (1999).
25. N. Ocelic and R. Hillenbrand, Nature Mater. 3, 606 (2004).
26. R. Hillenbrand, Ultramicroscopy 100, 421 (2004).