Crystallographically-dependent ripple formation on Sn surface irradiated with focused ion beam

Applied Surface Science

Volumn 240, Issue 1-4, 2005, Pages 140-145

  Qian, H X ^a   Zhou, W ^a   Fu, Y Q ^a   Ngoi, B K A ^a   Lim, G C ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

AFM; Crystallographic orientation; Focused ion beam; Ripple; Sn; Surface diffusion

Indexed keywords

ALUMINA; ANISOTROPY; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; DIFFUSION; ION BEAMS; IRRADIATION; MATHEMATICAL MODELS; METALLOGRAPHY; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SURFACES; TIN;

AFM; CRYSTALLOGRAPHIC ORIENTATION; FOCUSED ION BEAMS (FIB); RIPPLES; SURFACE DIFFUSION;

SURFACE CHEMISTRY;

EID: 10444250219     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.06.101     Document Type: Article

References (19)

1. M. Navez, C. Sella, D. Chaperot, Comptes Rendus. 254 (1962) 240.
2. T.M. Mayer, E. Chason, A.J. Howard, J. Appl. Phys. 76 (1994) 1633.
3. D. Flamm, F. Frost, D. Hirsch, Appl. Surf. Sci. 179 (2001) 95.
4. E. Chason, T.M. Mayer, B.K. Kellerman, D.T. McIlroy, A.J. Howard, Phys. Rev. Lett. 72 (1994) 3040.
5. J.J. Vajo, R.E. Doty, E.-H. Cirlin, J. Vac. Sci. Technol. A 14 (1996) 2709.
6. M. Kanazawa, A. Takano, Y. Higashi, M. Suzuki, Y. Homma, Appl. Surf. Sci. 203-204 (2003) 152.
7. S. Facsko, T. Dekorsy, C. Koerdt, C. Trappe, H. Kurz, A. Vogt, H.L. Hartnagel, Science 285 (1999) 1551.
8. R.M. Bradley, J.M.E. Harper, J. Vac. Sci. Technol. A 6 (1988) 2390.
9. M. Ritter, S. Stindtmann, M. Farle, K. Baberschke, Surf. Sci. 348 (1996) 243.
10. J. Naumann, J. Osing, A.J. Quinn, I.V. Shvets, Surf. Sci. 388 (1997) 212.
11. M.V.R. Murty, T. Curcic, A. Judy, Phys. Rev. B 60 (1999) 16956.
12. S. Rusponi, C. Boragno, U. Valbusa, Phys. Rev. Lett. 78 (1997) 2795.
13. G. Costantini, S. Rusponi, F. Buatier de Mongeot, C. Boragno, U. Valbusa, J. Phys. Condens. Matter 13 (2001) 5875.
14. G. Ehrlich, F.G. Hudda, J. Chem. Phys. 44 (19661039).
15. R.L. Schwoebel, E.J. Shipsey, J. Appl. Phys. 40 (1968) 614.
16. J. Erlebacher, M.J. Aziz, E. Chason, M.B. Sinclair, J.A. Floro, J. Vac. Sci. Technol. A 18 (2000) 115.
17. M.A. Makeev, R. Cuerno, A.-L. Barabási, Nucl. Instrum. Meth. B 197 (2002) 185.
18. S. Rusponi, G. Costantini, C. Boragno, U. Valbusa, Phys. Rev. Lett. 81 (1998) 4184.
19. S. Habenicht, W. Bolse, H. Feldermann, U. Geyer, H. Hofsäss, K.P. Lieb, F. Roccaforte, Europhys. Lett. 50 (2000) 209.