Lateral templating of self-organized ripple morphologies during focused ion beam milling of Ge

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 3, 2005, Pages 1068-1071

  Ichim, Stefan ^a   Aziz, Michael J ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION IRRADIATION; LATERAL TEMPLATING; RIPPLE ORGANIZATION; SELF-ORGANIZED RIPPLE MORPHOLOGIES;

GERMANIUM; ION BEAMS; MORPHOLOGY; NANOTECHNOLOGY;

MILLING (MACHINING);

EID: 31144469080     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1897711     Document Type: Article

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