Phase transition and phonon dynamics in NiPdSi: An annealing study by temperature-dependent Raman spectroscopy

Journal of Applied Physics

Volumn 105, Issue 3, 2009, Pages

  Karabko, A O ^a,b   Dostanko, A P ^b   Kong, J F ^a   Shen, W Z ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; DYNAMICS; MICROELECTRONICS; PALLADIUM; PHONONS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SPECTRUM ANALYSIS; THERMAL EXPANSION; THERMAL SPRAYING;

ALLOY DISORDERS; ANHARMONIC; ANNEALING TEMPERATURES; FIRST ORDERS; PHONON DECAYS; PHONON DYNAMICS; RAMAN FREQUENCIES; RAMAN PEAKS; RED SHIFTS; STRAIN EFFECTS; TEMPERATURE DEPENDENTS;

PHASE TRANSITIONS;

EID: 60449090112     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3073994     Document Type: Article

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