Micro-Raman spectroscopy investigation of nickel silicides and nickel (platinum) silicides

Electrochemical and Solid-State Letters

Volumn 3, Issue 3, 2000, Pages 153-155

  Lee, P S ^a   Mangelinck, D ^b   Pey, K L ^a   Shen, Z X ^a   Ding, J ^a   Osipowicz, T ^a   See, A ^c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^c CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

PHASE TRANSITIONS; RAMAN SPECTROSCOPY; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THERMAL EFFECTS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

MICRO RAMAN SPECTROSCOPY; NICKEL SILICIDE;

NICKEL COMPOUNDS;

EID: 0034159556     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390986     Document Type: Article

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