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Volumn 15, Issue 12, 2003, Pages 1935-1942

Comparison of the thermal stabilities of NiSi films in Ni/Si, Ni/Pd/Si and Ni/Pt/Si systems

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION EFFECTS; CRYSTAL ORIENTATION; HIGH TEMPERATURE EFFECTS; INTERFACIAL ENERGY; LATTICE CONSTANTS; NICKEL COMPOUNDS; NUCLEATION; REDUCTION; SILICON COMPOUNDS; SUBSTRATES; THERMODYNAMIC STABILITY;

EID: 0037414211     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/15/12/310     Document Type: Article
Times cited : (27)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.