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Volumn 15, Issue 12, 2003, Pages 1935-1942
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Comparison of the thermal stabilities of NiSi films in Ni/Si, Ni/Pd/Si and Ni/Pt/Si systems
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
COMPOSITION EFFECTS;
CRYSTAL ORIENTATION;
HIGH TEMPERATURE EFFECTS;
INTERFACIAL ENERGY;
LATTICE CONSTANTS;
NICKEL COMPOUNDS;
NUCLEATION;
REDUCTION;
SILICON COMPOUNDS;
SUBSTRATES;
THERMODYNAMIC STABILITY;
INTERLAYER MATERIALS;
NICKEL SILICIDES;
VEGARD LAW;
SOLID SOLUTIONS;
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EID: 0037414211
PISSN: 09538984
EISSN: None
Source Type: Journal
DOI: 10.1088/0953-8984/15/12/310 Document Type: Article |
Times cited : (27)
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References (20)
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