Raman spectral study on the thermal stability of Ni/Zr/Ni/Si and Ni/Co/Ni/Si structures

Journal of Raman Spectroscopy

Volumn 37, Issue 9, 2006, Pages 951-953

  Shao, Jia ^a   Lu, Jianzheng ^a   Huang, Wei ^a   Gao, Yuzhi ^a   Zhang, Lichun ^a   Zhang, Shu Lin ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

Ni(Pt)Si sandwich structure; Nickel silicide structure; Semiconductor devices; Thermal stability

Indexed keywords

CMOS INTEGRATED CIRCUITS; MOS DEVICES; NICKEL; OXIDE SEMICONDUCTORS; SANDWICH STRUCTURES; SILICIDES; SPECTROSCOPIC ANALYSIS;

CANDIDATE MATERIALS; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS DEVICES; FUTURE GENERATIONS; NI(PT)SI SANDWICH STRUCTURE; NICKEL SILICIDE; NICKEL SILICIDE STRUCTURE; RAMAN SPECTRAL; RAMAN SPECTRAL MEASUREMENTS; SEMICONDUCTOR NANOWIRE; SPECTRAL STUDIES;

THERMODYNAMIC STABILITY;

EID: 33749003756     PISSN: 03770486     EISSN: 10974555     Source Type: Journal    
DOI: 10.1002/jrs.1535     Document Type: Article

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