The preparation and refractive index of BST thin films

Physica B: Condensed Matter

Volumn 403, Issue 17, 2008, Pages 2618-2623

  Li, S Z ^a   Yang, Y Q ^a   Liu, L ^a   Liu, W C ^a   Wang, S B ^a  

^a WUHAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

BST thin film; Deposition parameter; Refractive index; RF magnetron sputtering

Indexed keywords

ANNEALING; ARGON; ATOMIC FORCE MICROSCOPY; BARIUM; CRYSTALLIZATION; DIFFRACTION; EMISSION SPECTROSCOPY; FIELD EMISSION; FILM PREPARATION; INERT GASES; LIGHT REFRACTION; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC GLASS; MICROSTRUCTURE; NANOCRYSTALLINE ALLOYS; OXIDE MINERALS; OXYGEN; QUARTZ; REFRACTIVE INDEX; REFRACTOMETERS; SCANNING ELECTRON MICROSCOPY; SOLIDS; SUBSTRATES; THIN FILM DEVICES; THIN FILMS; VAPOR DEPOSITION; X RAY ANALYSIS;

ANNEALING TEMPERATURES; ATOMIC-FORCE MICROSCOPIES; BST THIN FILM; DEPOSITION PARAMETER; DIFFRACTION PEAKS; FIELD EMISSION-SCANNING ELECTRON MICROSCOPIES; FUSED QUARTZ; HIGH QUALITIES; PRESSURE INCREASE; RADIO-FREQUENCY MAGNETRON SPUTTERING; RF MAGNETRON SPUTTERING; SPUTTERING PRESSURES; SUBSTRATE TEMPERATURES; TRANSMISSION SPECTRUMS; X-RAY DIFFRACTIONS;

ORGANIC POLYMERS;

EID: 60049097748     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2008.01.024     Document Type: Review

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