Effect of deposition parameters on crystallization of RF magnetron sputtered BST thin films

Key Engineering Materials

Volumn 336-338 I, Issue , 2007, Pages 79-82

  Zhang, T J ^a   Li, S Z ^a   Zhang, B S ^a   Huang, W H ^a   Pan, R K ^a  

^a HUBEI UNIVERSITY   (China)

Author keywords

BST thin films; Crystallization; Deposition parameter; Microstructure

Indexed keywords

ANNEALING; CRYSTALLIZATION; DEPOSITION; ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; MICROSTRUCTURE; X RAY DIFFRACTION;

ANNEALING TEMPERATURE; BST THIN FILMS; DEPOSITION PARAMETER; SPUTTERING PRESSURE;

THIN FILMS;

EID: 33947208480     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/0-87849-410-3.79     Document Type: Conference Paper

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