Plasma etching and roughening of thin polymeric films: A fast, accurate, in situ method of surface roughness measurement

Plasma Processes and Polymers

Volumn 5, Issue 9, 2008, Pages 825-833

  Kokkoris, George ^a   Vourdas, Nikolaos ^a   Gogolides, Evangelos ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

In situ characterization; Plasma etching; Polymers; Spectroscopic ellipsometry; Surface roughness; Thin films

Indexed keywords

ELLIPSOMETRY; ETCHING; FRICTION; MAGNETIC FILMS; METAL ANALYSIS; MOLECULAR BEAM EPITAXY; PLASMA ETCHING; PLASMAS; PLASTIC FILMS; POLYMERS; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; SURFACE PROPERTIES; SURFACE ROUGHNESS; THIN FILMS;

ATOMIC FORCES; CORNER POINTS; ETCHING RATES; ETCHING TIME; HARD SUBSTRATES; HEIGHT DISTRIBUTIONS; IN SITU CHARACTERIZATION; IN-SITU METHODS; IN-SITU MONITORING; INITIAL FILMS; ROOT MEAN SQUARES; SURFACE ROUGHNESS MEASUREMENTS; THIN POLYMERIC FILMS;

PHOTORESISTS;

EID: 60049097696     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200800071     Document Type: Article

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