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Volumn 143, Issue 11, 1996, Pages 3648-3651
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Optimized oxygen plasma etching of polyurethane-based electro-optic polymer for low loss optical waveguide fabrication
a a a a a b c c |
Author keywords
[No Author keywords available]
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Indexed keywords
ELECTROOPTICAL MATERIALS;
LIGHT ABSORPTION;
LIGHT MODULATORS;
LIGHT SCATTERING;
MASKS;
OPTICAL WAVEGUIDES;
OXYGEN;
PHOTORESISTS;
PLASMA ETCHING;
PRESSURE EFFECTS;
SURFACE ROUGHNESS;
THERMOSETS;
ETCH RATE;
ETCHING SELECTIVITY;
OPTICAL LOSS;
POLYURETHANES;
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EID: 0030290828
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1837265 Document Type: Article |
Times cited : (26)
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References (17)
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