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Volumn 143, Issue 11, 1996, Pages 3648-3651

Optimized oxygen plasma etching of polyurethane-based electro-optic polymer for low loss optical waveguide fabrication

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROOPTICAL MATERIALS; LIGHT ABSORPTION; LIGHT MODULATORS; LIGHT SCATTERING; MASKS; OPTICAL WAVEGUIDES; OXYGEN; PHOTORESISTS; PLASMA ETCHING; PRESSURE EFFECTS; SURFACE ROUGHNESS; THERMOSETS;

EID: 0030290828     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837265     Document Type: Article
Times cited : (26)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.