Optimized oxygen plasma etching of polyurethane-based electro-optic polymer for low loss optical waveguide fabrication

Journal of the Electrochemical Society

Volumn 143, Issue 11, 1996, Pages 3648-3651

  Chen, Antao ^a   Kaviani, Kian ^a   Rempel, Aron W ^a   Kalluri, Srinath ^a   Steier, William H ^a   Shi, Yongqiang ^b   Liang, Zhiyong ^c   Dalton, Larry R ^c  

^a University of Southern California ^*  (United States)

^b Tacoan Corporation   (United States)

^c UNIVERSITY OF SOUTHERN CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROOPTICAL MATERIALS; LIGHT ABSORPTION; LIGHT MODULATORS; LIGHT SCATTERING; MASKS; OPTICAL WAVEGUIDES; OXYGEN; PHOTORESISTS; PLASMA ETCHING; PRESSURE EFFECTS; SURFACE ROUGHNESS; THERMOSETS;

ETCH RATE; ETCHING SELECTIVITY; OPTICAL LOSS;

POLYURETHANES;

EID: 0030290828     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837265     Document Type: Article

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