Numerical study of the sputtering in a dc magnetron

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 1, 2009, Pages 20-28

  Kolev, Ivan ^a   Bogaerts, Annemie ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; MAGNETRONS; MATHEMATICAL MODELS; NUMERICAL ANALYSIS; PLASMAS; SPUTTERING;

BACKGROUND GASSES; DC MAGNETRONS; MAGNETRON PLASMAS; MONTE CARLO COLLISION METHODS; NUMERICAL SIMULATIONS; NUMERICAL STUDIES; PARTICLE IN CELLS; PRESSURE RANGES; SCATTERING ANGLES; SPUTTERED ATOMS; SUBSTRATE DISTANCES;

ATOMS;

EID: 58149512548     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3013856     Document Type: Article

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