Simulation of the sputtered atom transport during a pulse deposition process in single- and dual-magnetron systems

IEEE Transactions on Plasma Science

Volumn 31, Issue 5 I, 2003, Pages 994-1000

  Kuzmichev, Anatoly ^a   Goncharuk, Igor ^a  

^a NATIONAL TECHNICAL UNIVERSITY OF UKRAINE   (Ukraine)

Author keywords

Dual magnetron system; Magnetron sputtering; Pulse deposition; Single magnetron system; Sputtered atom transport

Indexed keywords

ATOMS; COMPUTER SIMULATION; MONTE CARLO METHODS; PULSED LASER DEPOSITION; SUBSTRATES; TRANSPORT PROPERTIES;

ATOM TRANSPORT; DUAL COPLANAR TARGET SYSTEM; DUAL MAGNETRON SYSTEMS; SINGLE MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

EID: 0242323698     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2003.818451     Document Type: Article

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