Growth of c-oriented ZnO films on (0 0 1) SrTiO3 substrates by MOCVD

Journal of Crystal Growth

Volumn 311, Issue 1, 2008, Pages 200-204

  Jia, Caihong ^a   Chen, Yonghai ^a   Liu, Genhua ^a   Liu, Xianglin ^a   Yang, Shaoyan ^a   Wang, Zhanguo ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

A1. Growth behavior; A1. SrTiO3; A3. MOCVD; B1. ZnO

Indexed keywords

CHEMICAL VAPOR DEPOSITION; EPITAXIAL FILMS; EPITAXIAL GROWTH; GROWTH (MATERIALS); LIGHT EMISSION; LUMINESCENCE; METALLIC FILMS; OPTOELECTRONIC DEVICES; ORGANIC CHEMICALS; ORGANIC COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR QUANTUM WELLS; STRONTIUM ALLOYS; TENSILE STRAIN;

A1. GROWTH BEHAVIOR; A1. SRTIO3; A3. MOCVD; B1. ZNO; C -AXIS; COLUMNAR GROWTHS; CRYSTAL QUALITIES; EPITAXIAL RELATIONSHIPS; GROWTH DIRECTIONS; HIGH QUALITIES; ORGANIC CHEMICAL VAPOR DEPOSITIONS; PRETREATMENT; SMOOTH SURFACES; SURFACE POLARITIES; ZNO FILMS; ZNO THIN FILMS;

ZINC OXIDE;

EID: 57649200464     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.10.017     Document Type: Article

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