Effects of surface roughness of substrates on the c-axis preferred orientation of ZnO films deposited by r.f. magnetron sputtering

Thin Solid Films

Volumn 423, Issue 2, 2003, Pages 262-266

  Lee, Jae Bin ^a   Kwak, Sang Hyun ^a   Kim, Hyeong Joon ^a  

^a Seoul National University   (South Korea)

Author keywords

Sputtering; Structural properties; Surface roughness; Zinc oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; PIEZOELECTRIC DEVICES; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

STRUCTURAL PROPERTIES;

THIN FILMS;

EID: 0037439581     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00977-X     Document Type: Article

References (11)

1. Frans C.M., De Pol Van. Ceram. Bull. 69:(12):1990;1959.
2. Nakanishi Y., Miyake A., Kominami H., Aoki T., Hatanaka Y., Shimaoka G. Appl. Surf. Sci. 142:1999;23.
3. Fujihara S., Kusakado J., Kimura T. J. Mater. Sci. Lett. 17:1998;781.
4. Bae S.H., Lee S.Y., Jin B.J., Im S. Appl. Surf. Sci. 154-155:2000;458.
5. Wu Mu-Shiang, Shin Wen-Ching, Tsai Woo-Hu. J. Phys. D: Appl. Phys. 31:1998;943.
6. Aita C.R., Purdes A.J., Lad R.J., Funkenbusch P.D. J. Appl. Phys. 55:(10):1980;5533.
7. Lee Yong Eui, Lee Jae Bin, Kim Young Jin, Yang Hyung Kook, Park Jong Chul, Kim Hyeong Joon. J. Vac. Sci. Technol. A. 14:(3):1996;1943.
8. Lee Yong Eui, Kim Soo Gil, Kim Young Jin, Kim Hyeong Joon. J. Vac. Sci. Technol. A. 15:(3):1997;1194.
9. Wang J.S., Lakin K.M. Appl. Phys. Lett. 42:(4):1983;352.
10. Gardeniers J.G.E., Rittersma Z.M., Burger G.J. J. Appl. Phys. 83:(12):1998;7844.
11. Davidse P.D., Maussel L.I. J. Appl. Phys. 37:(2):1966;574.