In-situ atomic force microscopy (AFM) imaging: Influence of AFM probe geometry on diffusion to microscopic surfaces

Langmuir

Volumn 24, Issue 22, 2008, Pages 12867-12876

  Burt, David P ^a   Wilson, Neil R ^a   Janus, Ulrich ^a   Macpherson, Julie V ^a   Unwin, Patrick R ^a  

^a UNIVERSITY OF WARWICK   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; ATOMS; DIFFUSION; DISKS (STRUCTURAL COMPONENTS); DISSOLUTION; ELECTROLYSIS; GROWTH (MATERIALS); MASS TRANSFER; NITRIDES; RATE CONSTANTS; SEMICONDUCTOR DOPING; SILICON; SILICON NITRIDE; SUBSTRATES; SURFACE DIFFUSION; THICKNESS MEASUREMENT; TWO DIMENSIONAL;

2D MODELS; ACTIVE SURFACE SITES; AFM IMAGING; AFM PROBES; ATOMIC FORCES; CONE ANGLES; CONTACT MODES; CRYSTAL DISSOLUTIONS; CURRENT RESPONSES; DISK ELECTRODES; DISSOLUTION PROCESSES; ELECTRODE REACTIONS; EXPERIMENTAL DATUMS; IN-SITU; MASS TRANSPORTS; MICROSCOPIC SURFACES; PROBE PARAMETERS; REACTIVE SURFACES; SILICON PROBES; SINGLE BEAMS; SUBSTRATE ELECTRODES; SURFACE PROCESSES;

ATOMIC FORCE MICROSCOPY;

EID: 57349089427     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la8003323     Document Type: Article

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