Nano-ridge fabrication by local oxidation of silicon edges with silicon nitride as a mask

Journal of Micromechanics and Microengineering

Volumn 16, Issue 6, 2006, Pages

  Haneveld, Jeroen ^a   Berenschot, Erwin ^a   Maury, Pascale ^a   Jansen, Henri ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ETCHING; MASKS; OXIDATION; PHOTOLITHOGRAPHY; SILICON NITRIDE;

FREQUENCY DOUBLING EFFECT; NANO-RIDGE FABRICATION; SILICON EDGES;

SILICON;

EID: 33646727153     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/16/6/S05     Document Type: Article

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