Nano-width lines using lateral pattern definition technique for nanoimprint template fabrication

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 599-603

  Grabiec, P B ^a   Zaborowski, M ^a   Domanski, K ^a   Gotszalk, T ^b   Rangelow, I W ^c  

^a ukasiewicz Research Network Institute of Microelectronics and Photonics   (Poland)

^b WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^c UNIVERSITY OF KASSEL   (Germany)

Author keywords

Nano technology; Nanoimprint; Nanolithography; Silicon on quartz

Indexed keywords

MASKS; NANOTECHNOLOGY; OXIDATION; PHOTORESISTS; PLASMA ETCHING; QUARTZ; SILICA; TRANSPARENCY;

NANOIMPRINT; NEXT GENERATION LITHOGRAPHY (NGL); SILICON-ON-QUARTZ;

MICROELECTRONICS;

EID: 2542467234     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00150-9     Document Type: Conference Paper

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