Multiscale simulation of nanoindentation on Ni (1 0 0) thin film

Applied Surface Science

Volumn 255, Issue 5 PART 2, 2008, Pages 3240-3250

  Wang, Chung Ting ^a   Jian, Sheng Rui ^b   Jang, Jason Shian Ching ^b   Lai, Yi Shao ^a   Yang, Ping Feng ^a  

^a ADVANCED SEMICONDUCTOR ENGINEERING INC   (Taiwan)

^b I SHOU UNIVERSITY   (Taiwan)

Author keywords

Dislocation; Finite element method; Hardness; Molecular dynamics; Multiscale simulation; Nanoindentation; Nickel; Young's modulus

Indexed keywords

DEFORMATION; DISLOCATIONS (CRYSTALS); ELASTIC MODULI; HARDNESS; MOLECULAR DYNAMICS; NANOINDENTATION; NICKEL; NUCLEATION; PILES; STRAIN ENERGY; SURFACE MORPHOLOGY; THIN FILMS;

DISLOCATION SLIDING; EXPERIMENTAL VALUES; HOMOGENEOUS NUCLEATION; INDENTATION CURVE; LITERATURE RESEARCHES; MULTI-SCALE MODELING; MULTI-SCALE SIMULATION; QUANTITATIVE AGREEMENT;

FINITE ELEMENT METHOD;

EID: 57049181866     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.09.034     Document Type: Article

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