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Volumn 16, Issue 4, 2001, Pages 1010-1027
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Effect of process variables on the structure, residual stress, and hardness of sputtered nanocrystalline nickel films
a b b c |
Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL MICROSTRUCTURE;
DEPOSITION;
GRAIN GROWTH;
GRAIN SIZE AND SHAPE;
NANOSTRUCTURED MATERIALS;
NICKEL;
POROSITY;
RESIDUAL STRESSES;
SPUTTERING;
SURFACE ROUGHNESS;
THIN FILMS;
NICKEL FILMS;
METALLIC FILMS;
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EID: 0035322576
PISSN: 08842914
EISSN: None
Source Type: Journal
DOI: 10.1557/JMR.2001.0142 Document Type: Article |
Times cited : (43)
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References (67)
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