Scaling behavior of internal stress in electrodeposited nickel thin films

Journal of Applied Physics

Volumn 104, Issue 9, 2008, Pages

  Saitou, M ^a   Oshiro, S ^a   Sagawa, Y ^a  

^a UNIVERSITY OF THE RYUKYUS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CORROSION; MAGNETIC FILMS; MOLECULAR BEAM EPITAXY; NICKEL ALLOYS; THICK FILMS; THIN FILMS;

ARRHENIUS TEMPERATURES; DYNAMIC SCALING THEORIES; ELECTRODEPOSITED NICKELS; INTERNAL STRESSES; SCALING BEHAVIORS;

GRAIN GROWTH;

EID: 56349139212     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3009336     Document Type: Article

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