Real-time evolution of electrical properties and structure of indium oxide and indium tin oxide during crystallization

Scripta Materialia

Volumn 60, Issue 4, 2009, Pages 199-202

  Rogozin, A ^a   Vinnichenko, M ^a   Shevchenko, N ^a   Kreissig, U ^a   Kolitsch, A ^a   Moller W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Annealing; Crystallization; Electrical properties; Thin films; Transparent conductive oxides

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CONDUCTIVE FILMS; CRYSTALLIZATION; ELECTRIC PROPERTIES; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; MEASUREMENTS; NANOCRYSTALLINE ALLOYS; OXIDE FILMS; PHOTOCURRENTS; SPECTROSCOPIC ANALYSIS; SPECTROSCOPIC ELLIPSOMETRY; THICK FILMS; TIN; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

DONOR ACTIVATIONS; ELASTIC RECOIL DETECTION ANALYSIS; ELECTRICAL PROPERTIES; FILM STRUCTURES; IN VACUUMS; IN-SITU; INDIUM OXIDE FILMS; INDIUM OXIDES; INDIUM TIN OXIDES; POINT PROBE MEASUREMENTS; REACTIVE MAGNETRON SPUTTERING; TIME EVOLUTIONS; TRANSPARENT CONDUCTIVE OXIDES; X-RAY DIFFRACTIONS;

INDIUM;

EID: 56249111619     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2008.09.020     Document Type: Article

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