Regulation of pattern dimension as a function of vacuum pressure: Alkyl monolayer lithography

Langmuir

Volumn 24, Issue 20, 2008, Pages 12077-12084

  Khatri, Om P ^a   Sano, Hikaru ^a   Murase, Kuniaki ^a   Sugimura, Hiroyuki ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BIOPOLYMERS; CONCENTRATION (PROCESS); ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; FIELD EMISSION; LITHOGRAPHY; MICROSCOPIC EXAMINATION; NANOPARTICLES; NANOSTRUCTURES; OXIDANTS; OXYGEN; PHOTODEGRADATION; PHOTOELECTRON SPECTROSCOPY; POLYMERS; VACUUM; VACUUM TECHNOLOGY; WATER VAPOR;

ALKYL MONOLAYERS; ATMOSPHERIC OXYGENS; EMISSION ELECTRONS; GOLD NANOPARTICLES; HIGH REPRODUCIBILITY; LATERAL FORCES; NANOSCOPIC CHANNELS; PATTERNED FEATURES; PHOTOPATTERNING; STRONG OXIDANTS; SUBMICRON DIMENSIONS; SUBMICRON PATTERNS; VACUUM PRESSURES; VACUUM ULTRAVIOLETS; VUV IRRADIATIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 55549123523     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la8021613     Document Type: Article

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