Reliable characterization of microcrystalline silicon films for thin film transistor applications

Japanese Journal of Applied Physics

Volumn 47, Issue 9 PART 1, 2008, Pages 7308-7310

  Abramov, Alexey ^a   Roca I Cabarrocas, Pere ^a   Girotra, Kunal ^b   Chen, Hong ^b   Park, Seungkyu ^b   Park, Kyongtae ^b   Huh, Jong Moo ^b   Choi, Joonhoo ^b   Kim, Chiwoo ^b   Souk, Jun H ^b  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Microcrystalline silicon; Structural characterization; Thin films

Indexed keywords

FILMS; INDUSTRIAL APPLICATIONS; METALLIC FILMS; MICROSTRUCTURE; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SPECTROSCOPIC ELLIPSOMETRY; THICK FILMS; THIN FILM DEVICES; THIN FILM TRANSISTORS; THIN FILMS; TRANSISTORS;

CHARACTERIZATION TECHNIQUES; FILM MICROSTRUCTURES; STRUCTURAL CHARACTERIZATION; TRANSISTOR APPLICATIONS; MICROCRYSTALLINE SILICON FILMS;

MICROCRYSTALLINE SILICON;

EID: 55149109226     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.7308     Document Type: Article

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