Determination of Raman emission cross-section ratio in hydrogenated microcrystalline silicon

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 1200-1203

  Vallat Sauvain, E ^a   Droz, C ^a   Meillaud, F ^a   Bailat, J ^a   Shah, A ^a   Ballif, C ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

Microcrystallinity; Raman scattering; STEM TEM; TEM STEM

Indexed keywords

CHEMICAL VAPOR DEPOSITION; PARAMETER ESTIMATION; RAMAN SCATTERING; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

MICROCRYSTALLINE SILICON; MICROCRYSTALLINITY; STEM/TEM; TEM/STEM;

CRYSTALLINE MATERIALS;

EID: 33744551882     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.11.128     Document Type: Article

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