High-spatial-resolution topographic imaging and dimer distance analysis of Si(100)-(2 × 1) using noncontact atomic force microscopy

Japanese Journal of Applied Physics

Volumn 47, Issue 7 PART 3, 2008, Pages 6085-6087

  Sawada, Daisuke ^a   Namtkawa, Takashi ^a   Hiragaki, Masuhiro ^a   Sugimoto, Yoshiaki ^a   Abe, Masayuki ^a,b   Morita, Seizo ^a  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Atomic force microscopy; Dimer structure; FM AFM; Frequency modulation; NC AFM; Si(100) (2 1)

Indexed keywords

ATOMIC PHYSICS; ATOMS; CRYSTAL ATOMIC STRUCTURE; FREQUENCY MODULATION; MICROSCOPIC EXAMINATION; MODULATION; SCANNING PROBE MICROSCOPY; SILICON;

AFM IMAGES; AVERAGE DISTANCES; BRIGHT SPOTS; DIMER STRUCTURE; DISTANCE ANALYSES; FM-AFM; NC-AFM; NONCONTACT ATOMIC FORCE MICROSCOPIES; ROOM TEMPERATURES; SI(100); TOPOGRAPHIC IMAGING;

ATOMIC FORCE MICROSCOPY;

EID: 55149101590     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.6085     Document Type: Article

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