Atomic resolution imaging on Si(100)2×1 and Si(100)2×1:H surfaces with noncontact atomic force microscopy

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 2 A, 2000, Pages

  Yokoyama, Kousuke ^a   Ochi, Taketoshi ^a   Yoshimoto, Akira ^a   Sugawara, Yasuhiro ^a   Morita, Seizo ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; CRYSTAL ATOMIC STRUCTURE; NONDESTRUCTIVE EXAMINATION; SILANES; SURFACE STRUCTURE;

ATOMIC RESOLUTION IMAGING;

SILICON;

EID: 0033903742     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.39.L113     Document Type: Article

References (28)