Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and Etch Masks

Advanced Materials

Volumn 20, Issue 10, 2008, Pages 1962-1965

  Krishnamoorthy, Sivashankar ^a   Pugin, Raphael ^a   Brugger, Juergen ^b   Heinzelmann, Harry ^a   Hinderling, Christian ^a  

^a CSEM   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; ADSORPTION; ATMOSPHERIC HUMIDITY; COLLOIDS; COPOLYMERIZATION; ELECTRON ENERGY LEVELS; MICELLES; ORGANIC POLYMERS; PLASTIC COATINGS; PLASTIC PRODUCTS; POLYMERS; SILANES; SILICON;

DIBLOCK COPOLYMER MICELLES; ETCH MASKS; MICELLE SOLUTIONS; MILLIPORE; OCTADECYLTRICHLOROSILANE; PARTICLE ARRAYS; PIRANHA SOLUTIONS; SILICON SUBSTRATES; VOLUME RATIOS;

SELF ASSEMBLED MONOLAYERS;

EID: 55049088177     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200702005     Document Type: Article

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