CVD of MgO thin films from bis(methylcyclopentadienyl) magnesium

Chemical Vapor Deposition

Volumn 13, Issue 4, 2007, Pages 185-189

  Carta, Giovanni ^a   El Habra, Naida ^a   Crociani, Laura ^a   Rossetto, Gilberto ^a   Zanella, Pierino ^a   Zanella, Alessandra ^b   Paolucci, Gino ^c   Barreca, Davide ^b   Tondello, Eugenio ^b  

^a CNR   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c CA' FOSCARI UNIVERSITY OF VENICE   (Italy)

Author keywords

Cyclopentadienyl precursor; MgO; Thin films

Indexed keywords

ABSORPTION; ABSORPTION SPECTROSCOPY; ATOMIC SPECTROSCOPY; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; MAGNESIUM; MAGNESIUM PRINTING PLATES; OPTICAL MICROSCOPY; OXIDE MINERALS; PHOTOELECTRON SPECTROSCOPY; QUARTZ; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS; THIN FILMS; X RAY ANALYSIS;

ATOMIC FORCES; CYCLOPENTADIENYL PRECURSOR; FILM PROPERTIES; GRANULAR; HIGH GROWTH RATES; LOW CARBONS; MGO; MGO THIN FILMS; OPTICAL ABSORPTIONS; PERICLASE; PROCESSING CONDITIONS; QUARTZ SUBSTRATES; SI(001); TEMPERATURE RANGES; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 54949103564     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200606574     Document Type: Article

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