Preferred orientations and microstructure of MgO films prepared by plasma-enhanced metalorganic chemical vapor deposition

Thin Solid Films

Volumn 352, Issue 1-2, 1999, Pages 85-90

  Fujii, E ^a   Tomozawa, A ^a   Torii, H ^a   Takayama, R ^a   Nagaki, M ^b   Narusawa, T ^b  

^a PANASONIC CORPORATION   (Japan)

^b KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Acetylacetonate complex; Auger electron spectroscopy; MgO; Plasma enhanced MOCVD; Rutherford backscattering spectroscopy; Scanning electron microscopy

Indexed keywords

EID: 0002717705     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00343-0     Document Type: Article

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