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Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1424-1429

Deposition of MgO thin film by liquid pulsed injection MOCVD

(6) Manin, Murielle a Thollon, S a Emieux, F a Berthome, G b Pons, M b Guillon, H c

a CEA GRENOBLE (France)

b UNIV GRENOBLE ALPES (France)

c QUALIFLOW SA (France)

Author keywords

Growth mechanism; Magnesium oxide (MgO); Organometallic chemical vapor deposition (OMCVD); Structural properties

Indexed keywords

ATMOSPHERIC PRESSURE; COMPOSITION; CRYSTAL STRUCTURE; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; OXIDATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

GROWTH MECHANISM; OXYGEN FLOW RATE; PULSED LIQUID-INJECTION METAL-ORGANIC CHEMICAL VAPOUR DEPOSITION TECHNIQUE; STRUCTURAL PROPERTIES;

MAGNESIA;

COATING;

EID: 28844480135 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.08.052 Document Type: Article

Times cited : (27)

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