Preparation and characterization of epitaxial MgO thin film by atmospheric-pressure metalorganic chemical vapor deposition

Journal of Crystal Growth

Volumn 169, Issue 3, 1996, Pages 474-479

  Zeng, J M ^a   Wang, H ^a   Shang, S X ^a   Wang, Z ^a   Wang, M ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING FILMS; SINGLE CRYSTALS; SUBSTRATES; SURFACE STRUCTURE; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

MAGNESIUM ACETYLACETONATE;

MAGNESIA;

EID: 0030413235     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00411-3     Document Type: Article

References (17)

1. K. Nashimoto, D.K. Fork and T.H. Gealle, Appl. Phys. Lett. 60 (1992) 1199.
2. K. Nashimoto, D.K. Fork, F.A. Pounce and J.C. Tramontana, Jpn. J. Appl. Phys. 32 (1993) 4099.
3. D.K. Fork et al., Appl. Phys. Lett. 58 (1991) 20.
4. L.D. Chang, M.Z. Tseng, E.L. Hu and D.K. Fork, Appl. Phys. Lett. 60 (1992) 1753.
5. L.S. Hang, L.R. Zhang and T.N. Blanton, Appl. Phys. Lett. 60 (1992) 3129.
6. B.S. Kwok and E.P. Boyd, Appl. Phys. Lett. 54 (1989) 25.
7. D.K. Fork, F.A. Pance, J.C. Tramontana and T.H. Geballe, Appl. Phys. Lett. 58 (1991) 2299.
8. Tonouchi Y. Sakaguchi and T. Kobayashi, J. Appl. Phys. 62 (1987) 961.
9. S. Yadavall, M.H. Yang and C.P. Flymn, Phys. Rev. B 41 (1990) 7961.
10. P.T. Wari, S. Sharan and J. Nayyran, J. Appl. Phys. 69 (1991) 8358.
11. E. Fujii et al., Jpn. J. Appl. 33 (1994) 6331.
12. J.-G. Yoon and K. Kim, Appl. Phys. Lett. 66 (1995) 20.
13. Y. Kaneko, N. Mikoshiba and T. Yamashita, Jpn. J. Appl. Phys. 62 (1987) 923.
14. R. Huang and A.H. Kitai, Appl. Phys. Lett. 61 (1992) 1450.
15. A. Masuda and K. Nashimoto, J. Appl. Phys. 33 (1994) 1793.
16. D.F. Eastman and I.B. Cutler, J. Am. Ceram. Soc. 49 (1966) 526.
17. Y. Fukada and I. Toyoshima, Surf. Sci. 158 (1985) 482.