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Chemical Vapor Deposition

Volumn 13, Issue 4, 2007, Pages 163-168

Atomic layer deposition of titanium disulfide thin films

(3) Pore, Viljami a Ritala, Mikko a Leskelä, Markku a

a UNIVERSITY OF HELSINKI (Finland)

Author keywords

ALD; FESEM; Layered transition metal dichalcogenides; Thin films; Titanium disulfide

Indexed keywords

ALUMINA; ATOMIC PHYSICS; ATOMS; CRYSTALLOGRAPHY; GLASS; IRIDIUM; PALLADIUM; PHYSICAL VAPOR DEPOSITION; PLATINUM; PRECIOUS METALS; PULSED LASER DEPOSITION; RHODIUM; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SOLIDS; THICK FILMS; THIN FILMS; TIN; TITANIUM; TITANIUM COMPOUNDS; TITANIUM NITRIDE; TRANSITION METALS; ZINC SULFIDE;

ALD; ALUMINA MEMBRANES; ATOMIC LAYER DEPOSITION (ALD; ATOMIC LAYERS; FESEM; HEXAGONAL; LAYERED TRANSITION METAL DICHALCOGENIDES; NOBLE METALS; PLATELIKE CRYSTALS; PORE WALLS; TITANIUM DISULFIDE; TITANIUM DISULFIDES;

ATOMIC LAYER DEPOSITION;

EID: 54949098933 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.200606530 Document Type: Article

Times cited : (40)

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