Deposition of lanthanum sulfide thin films by atomic layer epitaxy

Journal of Alloys and Compounds

Volumn 275-277, Issue , 1998, Pages 10-14

  Kukli, Kaupo ^a,b   Heikkinen, Hannele ^a   Nykänen, Erja ^a   Niinistö, Lauri ^a  

^a AALTO UNIVERSITY   (Finland)

^b UNIVERSITY OF TARTU   (Estonia)

Author keywords

Atomic layer epitaxy; Lanthanum oxysulfide; Lanthanum sulfide; Thin film; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; CRYSTALLIZATION; DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; FILM PREPARATION; HYDROGEN SULFIDE; LANTHANUM COMPOUNDS; OXYGEN; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER EPITAXY; LANTHANUM SULFIDE;

AMORPHOUS FILMS;

EID: 0032118659     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(98)00264-3     Document Type: Article

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