Dual-source chemical vapour deposition of titanium sulfide thin films from tetrakisdimethylamidotitanium and sulfur precursors

Journal of Materials Chemistry

Volumn 14, Issue 23, 2004, Pages 3474-3477

  Peters, Emily S ^a   Carmalt, Claire J ^a   Parkin, Ivan P ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CARBON; CHEMICAL VAPOR DEPOSITION; CONTAMINATION; ENERGY DISPERSIVE SPECTROSCOPY; NITROGEN; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SULFUR; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATMOSPHERIC CHEMICAL VAPOR DEPOSITION (APCVD); DUAL-SOURCE CHEMICAL VAPOR DEPOSITION; EDXA;

TITANIUM COMPOUNDS;

CARBON; NITROGEN; SULFIDE; SULFUR; TETRAKISDIMETHYLAMIDOTITANIUM; TITANIUM; UNCLASSIFIED DRUG;

ARTICLE; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; FILM; MATERIAL COATING; RAMAN SPECTROMETRY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE DEPENDENCE; VAPOR; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY POWDER DIFFRACTION;

EID: 10644275833     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b410390d     Document Type: Article

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