Atmospheric pressure chemical vapour deposition of TiS2 thin films on glass

Polyhedron

Volumn 22, Issue 9, 2003, Pages 1263-1269

  Carmalt, Claire J ^a   Parkin, Ivan P ^a   Peters, Emily S ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Atmospheric pressure chemical vapour deposition; Energy dispersive X ray analysis; TiS2

Indexed keywords

AMORPHOUS FILMS; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; GLASS; GLASS SUBSTRATES; METAL SUBSTRATES; NANOCRYSTALS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; THIN FILMS; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; CELL CONSTANT; ENERGY DISPERSIVE ANALYSIS; GLASS SUBSTRATES; HIGHLY REFLECTIVE; NANOCRYSTALLINES; S RATIO; SUBSTRATES TEMPERATURE; THIN-FILMS; X-RAY AMORPHOUS;

ENERGY DISPERSIVE X RAY ANALYSIS;

GLASS; SULFIDE; TITANIUM;

ARTICLE; ATMOSPHERIC PRESSURE; CHEMICAL STRUCTURE; CRYSTAL STRUCTURE; FILM; RAMAN SPECTROMETRY; REACTION ANALYSIS; SCANNING ELECTRON MICROSCOPY; STRUCTURE ANALYSIS; TEMPERATURE DEPENDENCE; X RAY CRYSTALLOGRAPHY;

EID: 0038066905     PISSN: 02775387     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0277-5387(03)00067-6     Document Type: Article

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