Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing

Journal of Applied Physics

Volumn 104, Issue 6, 2008, Pages

  Miyake, M ^a,b   Scott, J F ^b   Lou, X J ^b,c   Morrison, F D ^b,d   Nonaka, T ^a   Motoyama, S ^a   Tatsuta, T ^a   Tsuji, O ^a  

^a 33 Tanakamiya cho Takeda F   (Japan)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^d UNIVERSITY OF ST ANDREWS   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 54749141629     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2981197     Document Type: Article

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